Autonomous robotic mechanical exfoliation of two-dimensional semiconductors combined with Bayesian optimization

Simple mechanical exfoliation of layered materials is the most frequently employed method for producing high-quality monolayers of two-dimensional semiconducting materials. However, the mechanical exfoliation by human hands is a microscopically sophisticated process with a large number of microscopic parameters, which requires significant operator efforts and limits the reproducibility in achieving high-quality and large-area monolayer semiconducting materials. Herein, we have proposed a new strategy for the mechanical exfoliation by combining a developed robotic system and Bayesian optimization. We have demonstrated that it is possible to explore the optimized experimental conditions among a large number of parameter combinations for mechanical exfoliation in a relatively small number of experimental trials. Moreover, the entire mechanical exfoliation process from preparation to detection of monolayer semiconductors was performed by the developed autonomous robotic system. The optimized experimental condition was determined through only 30 trials of mechanical exfoliation experiments, representing 2.5% of all experimental parameter conditions. As a result, the critical parameters for the efficient fabrication of large-area monolayer WSe$_2$ were elucidated.