Simultaneous atomic resolution imaging and electrical characterization of 2D quantum devices

Direct correlation between (opto-/magneto-)electronic properties and structure is critical for the understanding of nanoscale and quantum devices. Recent developments in (scanning) transmission electron microscopy ((S/TEM) allow acquisition of atomic resolution images at cryogenic temperatures while measuring electrical properties. The S/TEM therefore acts as a cryostat with added functionalities of imaging, 4D STEM and electron energy loss spectroscopy to investigate excitations. We present our progress towards in-situ electrical characterization of 2D quantum devices. Electronic properties of 2D materials are commonly measured using graphene/BN/X/BN heterostructures, where graphene is the gate electrode, BN the dielectric, and in our case X=WSe₂, MoS₂, Cr₂Ge₂Te₆. We use atomic mass contrast to obtain atomic resolution images of the X layers and show that that atomic rearrangements at edges and defects depend on the beam current and acceleration voltage, and that BN reduces radiation damage effects. Finally, we measure the structure of defects in helium ion-irradiated MoS₂ and WSe₂ devices and perform optical spectroscopy ex-situ.

This work is supported by DOE Quantum Science Center and MIT Research Support Committee.