Improving the process of anodic abrasive polishing of small-section channels

The article studies the issues of increasing the quality of the surface and structure of a current-carrying skin layer in the small-section waveguide channels. We offer a promising technique of anodic abrasive polishing, which allows to remove anodic films from a machinable surface, activate and polish microroughnesses. We have developed the flow-chart of anodic abrasive polishing of small-section channels and undertaken a study. The process of anodic abrasive polishing can ensure the high quality of soft materials without impregnation of a machinable surface, as well as the high quality of hard materials with fine finish to Ra 0,04 micrometers keeping the original accuracy and structure of a current-carrying skin layer. We have presented a model and some recommendations how to perform anodic abrasive polishing.