Ultraviolet/vacuum-ultraviolet emission from a high power magnetron sputtering plasma with an aluminum target
Abstract
We report the in situ measurement of the ultraviolet/vacuum-ultraviolet (UV/VUV) emission from a plasma produced by high power impulse magnetron sputtering with aluminum target, using argon as background gas. The UV/VUV detection system is based upon the quantification of the re-emitted fluorescence from a sodium salicylate layer that is placed in a housing inside the vacuum chamber, at 11 cm from the center of the cathode. The detector is equipped with filters that allow for differentiating various spectral regions, and with a front collimating tube that provides a spatial resolution ≈ 0.5 cm. Using various views of the plasma, the measured absolutely calibrated photon rates enable to calculate emissivities and irradiances based on a model of the ionization region. We present results that demonstrate that Al+ ions are responsible for most of the VUV irradiance. We also discuss the photoelectric emission due to irradiances on the target [ image ] produced by high energy photons from resonance lines of Ar+.
- Publication:
-
Journal of Physics D Applied Physics
- Pub Date:
- January 2020
- DOI:
- 10.1088/1361-6463/ab52f8
- Bibcode:
- 2020JPhD...53e5202I
- Keywords:
-
- magnetron sputtering;
- HiPIMS/HPPMS;
- ultraviolet/vacuum-ultraviolet;
- sodium salicylate;
- absolute calibration;
- in situ;
- photo emission