Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning Lin, Jiaxin ; Dong, Lisong ; Fan, Taian ; Ma, Xu ; Chen, Rui ; Wei, Yayi Abstract Publication: Applied Optics Pub Date: March 2020 DOI: 10.1364/AO.384407 Bibcode: 2020ApOpt..59.2829L