Ultrathin monolithic HfO2 formed by Hf-seeded atomic layer deposition on MoS2: Film characteristics and its transistor application
Abstract
- Publication:
-
Thin Solid Films
- Pub Date:
- March 2019
- DOI:
- 10.1016/j.tsf.2019.01.039
- Bibcode:
- 2019TSF...673..112K