High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
Abstract
- Publication:
-
Journal of Colloid and Interface Science
- Pub Date:
- January 2019
- DOI:
- 10.1016/j.jcis.2018.09.040
- Bibcode:
- 2019JCIS..534..420R