Photoresist removal using hydrogen radicals produced by tantalum hot-wire catalyst
Abstract
Photoresist removal method using hydrogen radicals produced by decomposing hydrogen on a hot-wire catalyst is one of an environmentally friendly methods. We examined the relationship between photoresist removal rate and its surface temperature and the surface element analysis for a tantalum catalyst. In this study, we considered an adaptability of the catalyst to the removal.
- Publication:
-
Nanoscience and Nanotechnology: NANO-SciTech
- Pub Date:
- August 2019
- DOI:
- 10.1063/1.5124640
- Bibcode:
- 2019AIPC.2151b0010Y