Influence of Electrical Properties on Radiation and Emission to Pinch Radius Thermal Plasma Device

Plasma focus (PF) generation has advanced the development of high-density, high-temperature plasma that emits intense radiation. The radiation output and emission spectra depend on the operating parameters of the PF device. The ability to focus plasma governs the pinch radius and electrical properties at the truncated end of the PF device. In this study, the simulation system RADPF 5.15 FIB was used to investigate the pinching properties of the neon ion beam generated using an AECS PF-1 device. The pinch radius was the dominant factor affecting the current density produced.