Extraction of an aluminum-nitride ion beam from a planar magnetron sputter type ion source
Abstract
Beams of aluminum-nitride ion (AlN+) were extracted from a planar magnetron sputter type ion source equipped with an aluminum target. The source was operated with an interval of pure N2 gas operation and a successive interval of pure Ar gas discharge. The AlN+ beam current was not stable throughout the series of measurements. The expected sputtering process of Ar+ to AlN layer can be found; during some N2 discharge cycle, the AlN+ beam current gradually increased in accordance with the formation of AlN layer. During Ar discharge, AlN+ decreased suggesting depletion of nitrogen in the aluminum target. However, completely different characteristics were also observed in the successive operation, indicating more complicated plasma surface interaction process governs the production of AlN+ in a N2 discharge.
- Publication:
-
Proceedings of the 17th International Conference on Ion Sources
- Pub Date:
- September 2018
- DOI:
- 10.1063/1.5053373
- Bibcode:
- 2018AIPC.2011h0018Y