Interactions of DNA molecule with oxide nano structures
Abstract
Here we investigate the interaction of plasmid DNA with two semiconductor oxide surfaces, SiOx and TiO2. The oxide surfaces were also irradiated by low energy ion beams. Ion irradiation with 3 keV Ar+ ions has been utilized to create nano patterns on the SiOx and TiO2 surfaces. These surfaces display formation of nanostructure patterns through the competitive phenomenon of erosion and diffusion processes. These nano-patterned surfaces were also interacted with plasmid DNA. On the SiOx surface the diameter of DNA decreases with fluence whereas on the TiO2 surfaces the DNA diameter increases with fluence. DNA adsorption on surfaces indicates several types of chemical interactions as well as charge transfer. These results suggest severe modifications in the DNA moiety upon adsorption and thus can be important in biosensor related applications.
- Publication:
-
Advanced Materials
- Pub Date:
- August 2018
- DOI:
- 10.1063/1.5050727
- Bibcode:
- 2018AIPC.2005b0010M