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High-reflection Mo/Be/Si multilayers for EUV lithography
- Chkhalo, Nikolai I.
;
- Gusev, Sergei A.
;
- Nechay, Andrey N.
;
- Pariev, Dmitry E.
;
- Polkovnikov, Vladimir N.
;
- Salashchenko, Nikolai N.
;
- Schäfers, Franz
;
- Sertsu, Mewael G.
;
- Sokolov, Andrey
;
- Svechnikov, Mikhail V.
;
- Tatarsky, Dmitry A.
- Publication:
-
Optics Letters
- Pub Date:
- December 2017
- DOI:
-
10.1364/OL.42.005070
- Bibcode:
-
2017OptL...42.5070C
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