Thermal processes during reactive sputtering of hot titanium target
Abstract
The substrate heating processes during the DC magnetron sputtering of a hot titanium target were investigated. The sensitive element of a thermocouple was used as a substrate. It was found, that the heating curves of the substrate have the inflection point when the magnetron with a hot titanium target is on. The position of the inflection point is directly proportional to the argon pressure and inversely proportional to the discharge current density. The temperature of the target in the stationary mode increases when the pressure decreases. The time constant of the substrate heating process is directly proportional to the pressure and inversely proportional to the discharge current density. Power radiated on the substrate, when the magnetron with the hot target is on, is proportional to the discharge current density. For a cold target, this dependence is similar, but has a significantly smaller derivative.
- Publication:
-
Journal of Physics Conference Series
- Pub Date:
- May 2017
- DOI:
- 10.1088/1742-6596/857/1/012031
- Bibcode:
- 2017JPhCS.857a2031M