Remoldable Thiol-Ene Vitrimers for Photopatterning and Nanoimprint Lithography Lyon, Gayla Berg ; Cox, Lewis M. ; Goodrich, J. Taylor ; Baranek, Austin D. ; Ding, Yifu ; Bowman, Christopher N. Abstract Publication: Macromolecules Pub Date: December 2016 DOI: 10.1021/acs.macromol.6b01281 Bibcode: 2016MaMol..49.8905L