Titanium Silicide/Titanium Nitride Full Metal Gates for Dual-Channel Gate-First CMOS Frank, Martin M. ; Cabral, Cyril ; Dechene, Jessica M. ; Ortolland, Claude ; Zhu, Yu ; Marshall, Eric D. ; Murray, Conal E. ; Chudzik, Michael P. Abstract Publication: IEEE Electron Device Letters Pub Date: February 2016 DOI: 10.1109/LED.2015.2513760 Bibcode: 2016IEDL...37..150F