Growth, structure, and magnetic properties of γ‧-Fe4 N thin films
Abstract
We have grown phase-pure, buffer-free, and epitaxial α-Fe and γ‧-Fe4 N thin films by RF magnetron sputtering onto MgO (100) substrates. The film thicknesses and densities have been determined with high accuracy by evaluating the Kiessig fringes of the X-ray reflectometry measurements. We have determined the volume saturation magnetization of γ‧-Fe4 N with corresponding accuracy to be Ms = 1556 ± 62 emu /cm3 at 10 K or 2.30 ± 0.09μB per Fe atom. The Curie-temperature, TC, of the γ‧-Fe4 N thin films was 716 K. The slightly increased average magnetic moment per Fe atom of γ‧-Fe4 N as compared to α-Fe is in agreement with literature values and attributed to the volume expansion of the unit cell.
- Publication:
-
Journal of Magnetism and Magnetic Materials
- Pub Date:
- April 2015
- DOI:
- 10.1016/j.jmmm.2014.12.033
- Bibcode:
- 2015JMMM..379..151D
- Keywords:
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- Magnetic properties of monolayers and thin films;
- Saturation moments and magnetic susceptibilities;
- Magnetic anisotropy;
- Fe and its alloys;
- Deposition by sputtering