Thin-Film Deposition With Refractory Materials Using a Vacuum Arc Beilis, Isak I. ; Koulik, Yosef ; Yankelevich, Yefim ; Arbilly, David ; Boxman, Raymond L. Abstract Publication: IEEE Transactions on Plasma Science Pub Date: August 2015 DOI: 10.1109/TPS.2015.2432577 Bibcode: 2015ITPS...43.2323B