EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation
Abstract
In this paper we present EPIC, an efficient and effective predictor for IC manufacturing hotspots in deep sub-wavelength lithography. EPIC proposes a unified framework to combine different hotspot detection methods together, such as machine learning and pattern matching, using mathematical programming/optimization. EPIC algorithm has been tested on a number of industry benchmarks under advanced manufacturing conditions. It demonstrates so far the best capability in selectively combining the desirable features of various hotspot detection methods (3.5-8.2% accuracy improvement) as well as significant suppression of the detection noise (e.g., 80% false-alarm reduction). These characteristics make EPIC very suitable for conducting high performance physical verification and guiding efficient manufacturability friendly physical design.
- Publication:
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arXiv e-prints
- Pub Date:
- February 2014
- DOI:
- 10.48550/arXiv.1402.2904
- arXiv:
- arXiv:1402.2904
- Bibcode:
- 2014arXiv1402.2904D
- Keywords:
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- Computer Science - Hardware Architecture
- E-Print:
- doi:10.1109/ASPDAC.2012.6164956