A new measurement method for electrode gain in an orthogonally symmetric beam position monitor

The new beam position monitor (BPM) system of the injector at the upgrade project of the Hefei Light Source (HLS II) has 19 stripline beam position monitors. Most consist of four orthogonally symmetric stripline electrodes. Differences in electronic gain and mismachining tolerance can cause changes in the beam response of the BPM electrodes. This variation will couple the two measured horizontal positions, resulting in measuring error. To alleviate this effect, a new technique to measure the relative response of the four electrodes has been developed. It is independent of the beam charge, and the related coefficient can be calculated theoretically. The effect of electrode coupling on this technique is analyzed. The calibration data is used to fit the gain for all 19 injector beam position monitors. The results show the standard deviation of the distribution of measured gains is about 5%.