Analysis of thermal vias in molded interconnect devices
Abstract
The ongoing miniaturization of micro-opto-electro-mechanical-systems requires compact multifunctional packaging solutions like offered by the three-dimensional MID (molded interconnect device) technology which combines integrated electronic circuitry and mechanical support structures directly into one compact housing. Due to the inherently large thermal resistance of thermoplastic MID substrate materials, temperature-sensitive applications require carefully arranged thermal vias in order to reduce the thermal resistance of the packaging effectively. This paper presents the analysis and optimization of various laser-drilled thermal via design parameters of MIDs including hole diameter, pitch, plating thickness of the Cu/Ni/Au metallization layers as well as the void level of the filling material inside the vias.
- Publication:
-
Smart Sensors, Actuators, and MEMS VI
- Pub Date:
- May 2013
- DOI:
- 10.1117/12.2017361
- Bibcode:
- 2013SPIE.8763E..0BR