Epitaxially passivated mesa-isolated InGaAs photodetectors
Abstract
We have fabricated low-dark-current InGaAs photodetectors utilizing an epitaxial structure incorporating an InAlGaAs passivation layer and a simple mesa isolation process, and requiring no implant or diffusion steps. At 295 K, areal and perimeter dark current contributions are 15 nA/cm2 and 9 pA/cm, respectively, in devices with large aspect ratios biased at -0.1 V. High responsivity was achieved even at zero bias in these devices. Devices were modeled using a commercial drift-diffusion simulator. Good fits to reverse dark current-voltage measurements were obtained using a model that included both bulk and interfacial generation mechanisms. Assuming similar electron and hole Shockley-Read-Hall lifetimes, dark current under small reverse bias are consistent with generation at the interface between the absorber and underlying layers. With increasing negative bias a large increase in dark current is associated with depletion near the InAlGaAs/absorber interface, while small increases in current at large reverse bias suggest long Shockley-Read-Hall lifetimes in the absorber. Forward biasing of these devices results in efficient injection of minority carrier holes into the absorber region, mimicking photogeneration and providing a method to predict the performance of illuminated detector arrays.
- Publication:
-
Infrared Technology and Applications XXXIX
- Pub Date:
- June 2013
- DOI:
- 10.1117/12.2016558
- Bibcode:
- 2013SPIE.8704E..02K