Etch induced microwave losses in titanium nitride superconducting resonators
Abstract
We have investigated the correlation between the microwave loss and patterning method for coplanar waveguide titanium nitride resonators fabricated on silicon wafers. Three different methods were investigated: fluorine- and chlorine-based reactive ion etches and an argon-ion mill. At high microwave probe powers, the reactive etched resonators showed low internal loss, whereas the ion-milled samples showed dramatically higher loss. At single-photon powers, we found that the fluorine-etched resonators exhibited substantially lower loss than the chlorine-etched ones. We interpret the results by use of numerically calculated filling factors and find that the silicon surface exhibits a higher loss when chlorine-etched than when fluorine-etched. We also find from microscopy that re-deposition of silicon onto the photoresist and side walls is the probable cause for the high loss observed for the ion-milled resonators.
- Publication:
-
Applied Physics Letters
- Pub Date:
- June 2012
- DOI:
- 10.1063/1.4729623
- arXiv:
- arXiv:1205.3153
- Bibcode:
- 2012ApPhL.100z2605S
- Keywords:
-
- coplanar waveguides;
- microwave resonators;
- photoresists;
- sputter etching;
- superconducting microwave devices;
- superconducting resonators;
- titanium compounds;
- 85.25.Qc;
- 84.40.Az;
- Superconducting surface acoustic wave devices and other superconducting devices;
- Waveguides transmission lines striplines;
- Condensed Matter - Superconductivity
- E-Print:
- Appl. Phys. Lett. 100, 262605 (2012)