Overlapping-gate architecture for silicon Hall bar MOSFET devices in the low electron density and high magnetic field regime
Abstract
A common issue in low temperature measurements of enhancement-mode metal-oxide-semiconductor (MOS) field-effect transistors (FETs) in the low electron density regime is the high contact resistance dominating the device impedance. In that case a voltage bias applied across the source and drain contact of a Hall bar MOSFET will mostly fall across the contacts (and not across the channel) and therefore magneto-transport measurements become challenging. However, from a physical point of view, the study of MOSFET nanostructures in the low electron density regime is very interesting (impurity limited mobility [1], carrier interactions [2,3] and spin-dependent transport [4]) and it is therefore important to come up with solutions [5,6] that work around the problem of a high contact resistance in such devices (c.f. Fig. 1 (a)).
- Publication:
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arXiv e-prints
- Pub Date:
- October 2011
- DOI:
- 10.48550/arXiv.1110.1418
- arXiv:
- arXiv:1110.1418
- Bibcode:
- 2011arXiv1110.1418W
- Keywords:
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- Condensed Matter - Mesoscale and Nanoscale Physics;
- Condensed Matter - Materials Science
- E-Print:
- 3 pages