Effects of deposition temperature on the structural and morphological properties of thin ZnO films fabricated by pulsed laser deposition
ZnO thin films were grown on Si(1 0 0) substrates using pulsed laser deposition in O 2 gas ambient (10 Pa) and at different substrate temperatures (25, 150, 300 and 400 °C). The influence of the substrate temperature on the structural and morphological properties of the films was investigated using XRD, AFM and SEM. At substrate temperature of T=150 °C, a good quality ZnO film was fabricated that exhibits an average grain size of 15.1 nm with an average RMS roughness of 3.4 nm. The refractive index and the thickness of the thin films determined by the ellipsometry data are also presented and discussed.