Scaling law of anomalous Hall effect in Fe/Cu bilayers
Abstract
The scaling of anomalous Hall resistivity on longitudinal resistivity has been intensively studied in different magnetic systems, including multilayer and granular films, to examine whether a skew scattering or a side jump mechanism dominates in the origin of anomalous Hall effect (AHE). The scaling law is based on the premise that both resistivities are a consequence of electron scattering by the imperfections in the materials. By studying the anomalous Hall effect in the simple Fe/Cu bilayers, it was demonstrated that the measured anomalous Hall effect should not follow the scaling laws derived from skew scattering or side jump mechanism due to the short-circuit and shunting effects of the non-magnetic layers.
- Publication:
-
European Physical Journal B
- Pub Date:
- September 2008
- DOI:
- 10.1140/epjb/e2008-00350-3
- arXiv:
- arXiv:0802.1462
- Bibcode:
- 2008EPJB...65..233X
- Keywords:
-
- 72.15.Gd Galvanomagnetic and other magnetotransport effects;
- 72.15.-v Electronic conduction in metals and alloys;
- 81.15.Cd Deposition by sputtering;
- 72.15.Gd;
- 72.15.-v;
- 81.15.Cd;
- Galvanomagnetic and other magnetotransport effects;
- Electronic conduction in metals and alloys;
- Deposition by sputtering;
- Condensed Matter - Other Condensed Matter
- E-Print:
- 12 pages, 4 figures