Dielectric and Interface Properties of TiO2/HfSiO/SiO2 Layered Structures Fabricated by in situ PVD Method Arimura, Hiroaki ; Naitou, Yuichi ; Kitano, Naomu ; Oku, Yudai ; Yamaguchi, Nobuo ; Kosuda, Motomu ; Hosoi, Takuji ; Shimura, Takayoshi ; Watanabe, Heiji Abstract Publication: ECS Transactions Pub Date: October 2008 DOI: 10.1149/1.2981593 Bibcode: 2008ECSTr..16e.121A