Influence of Cu Electroplating Solution on Self-Assembled Porous Silica Low-k Films Shimoyama, Masashi ; Yagi, Ryotaro ; Chikaki, Shinichi ; Fujii, Nobutoshi ; Nakayama, Takahiro ; Kohmura, Kazuo ; Tanaka, Hirofumi ; Kinoshita, Keizo ; Kikkawa, Takamaro Abstract Publication: Journal of the Electrochemical Society Pub Date: September 2006 DOI: 10.1149/1.2218263 Bibcode: 2006JElS..153G.870S