The Formation and Motion of CCl4- in CCl4 - Ar Mixture
Abstract
This article deals with the measurement of the mobility of negative ions in the mixtures of CCl4 with Ar with the CCl4 ratio up to 33.3%. The Pulsed Townsend Technique was employed to produce an integrated ionic avalanches over a range of the density-reduced electric field E/N for which ionization is either negligible or absent, and attachment processes are dominant, leading to the formation of mostly CCl4-. The E/N range of measurement was 1 to 50 Td (1Td = 10-17 Vcm2). Our measurements strongly suggest that attachment is the dominant process and only negative ions are formed.
- Publication:
-
Plasma and Fusion Science: 16th IAEA Technical Meeting on Research using Small Fusion Devices
- Pub Date:
- December 2006
- DOI:
- 10.1063/1.2405949
- Bibcode:
- 2006AIPC..875..278M
- Keywords:
-
- 52.25.Jm;
- 52.80.Dy;
- 52.25.Fi;
- Ionization of plasmas;
- Low-field and Townsend discharges;
- Transport properties