Aerial-image-based inspection on subresolution scattering bars
Abstract
The paper presents the results of a study to define a production-worthy inspection technique for subresolution solid and hollow scattering features used in 193-nm lithography. Masks are inspected using conventional high-NA and aerial-imaging-based mask inspection tools. Inspection results are compared regarding capture rate and nuisance defect rate.
- Publication:
-
24th Annual BACUS Symposium on Photomask Technology
- Pub Date:
- December 2004
- DOI:
- 10.1117/12.579749
- Bibcode:
- 2004SPIE.5567...36H