CVD Rhenium and PVD Tantalum Gate MOSFETs Fabricated With a Replacement Technique Pan, J. ; Canaperi, D. ; Jammy, R. ; Steen, M. ; Pellerin, J. ; Lin, M. -R. Abstract Publication: IEEE Electron Device Letters Pub Date: December 2004 DOI: 10.1109/LED.2004.838051 Bibcode: 2004IEDL...25..775P