Plasma properties during pulsed DC sputter-deposition of TiO2 photocatalytic thin films
Abstract
Thin films of TiO2 are very attractive for photocatalytic applications to decompose organic pollutants. Photocatalytically active thin films of TiO2 can be deposited by pulsed DC reactive sputtering. The performance of the films as catalysts is strongly determined by the thin film crystalline structure and, therefore, by the deposition conditions. In this work, time-resolved optical emission spectroscopy is employed to investigate and control the pulsed DC magnetron plasma used to reactively deposit TiO2 films. Depositions are carried out using a pulsing frequency of 60 kHz and off-times of 3 and 5 us. Optical measurements were done employing a fast intensified CCD (ICCD) camera. Work supported by the U.S. Army.
- Publication:
-
APS Annual Gaseous Electronics Meeting Abstracts
- Pub Date:
- September 2004
- Bibcode:
- 2004APS..GECES1048Z