Development of a compact and precise ion irradiation system

A compact and precise ion irradiation system has been developed to study the mechanism of radiation effects on materials and devices. This system has been constructed on the basis of a 200 keV ion implanter, and together with precise lenses and deflectors it produces a beam of a single ion (i.e. one ion in one pulse), 1 ns in pulse width and 1 μm in diameter. To monitor the beam position, a quadrant-type electrode with a hole in its center was placed at the entrance to beam focusing components. Also an automatic beam adjustment system based on an optimization method was introduced for aid in the operation of the accelerator. Moreover, a beam control system connecting with "internet" is on trial for users to operate this irradiation system remotely.