Self-aligned nickel, cobalt/tantalum nitride stacked-gate pMOSFETs fabricated with a low temperature process after metal electrode deposition
Abstract
- Publication:
-
IEEE Transactions on Electron Devices
- Pub Date:
- December 2003
- DOI:
- 10.1109/TED.2003.819434
- Bibcode:
- 2003ITED...50.2456P