Angle Resolved X-ray Photelectron Spectroscopy of 2-methyl-4-nitroanaline Thin Films

Angle resolve XPS (ARXPS) was performed on thin films of 2-methyl-4-nitroanaline (MNA) vapor deposited onto a Si(001) substrate. The relative concentrations of the different components observed in the MNA film at takeoff angles of 30 and 90 degrees was determined. This allows an estimation of the layer composition and thickness as well as depth of all layers within a region of several electron escape depths from the surface. The results obtained are compared to layer thicknesses from ellipsometric measurements and atomic force microscopy (AFM).