Pulsed Laser Ablation and Deposition with the Thomas Jefferson National Accelerator Facility Free Electron Laser
Abstract
We have been conducting some of the first experiments in pulsed laser ablation and deposition with the Thomas Jefferson National Accelerator Facility Free Electron Laser (TJNAF-FEL). The wavelength tunability, high average power (up to 1.72 kW), very high repetition rate (cw rate up to 74 MHz) and ultrafast pulses ( 650 fs) of the TJNAF-FEL present a combination of parameters unmatched by any laser, which has marked benefits for ablation and deposition. We will be presenting results on ablation of metals (Co,NiFe,Ti,Nb). Comparison with thin films deposited with a standard nanosecond laser source and an ultrafast low-repetition rate laser system show the advantage of using the FEL to produce high quality films at high deposition rates. Preliminary optical spectroscopy studies of the ablation plume and electron/ion emission studies during ablation will also be presented.
- Publication:
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APS Division of Atomic, Molecular and Optical Physics Meeting Abstracts
- Pub Date:
- May 2002
- Bibcode:
- 2002APS..DMP.R5006R