Optical and X-ray studies of MOCVD-grown InGaN epilayers with low indium concentration
Abstract
Optical and X-ray studies of MOCVD-grown InGaN epilayers with low indium concentration G. H. Park, S. J. Hwang, S. K. Shee, T. Sugahara, J. B. Lam, G. H. Gainer and J. J. Song, Center for Laser and Photonics Research and Department of Physics, Oklahoma State University, Stillwater, OK 74078, USA; S. Sakai, Electrical and Electronic Department, University of Tokushima, Tokushima, Japan. In_xGa_1-xN epilayers with low indium concentration (x < 5%) were grown by low pressure metalorganic chemical vapor deposition on (0001) sapphire. These samples were characterized by optical techniques and high-resolution X-ray diffraction. Photoluminescence (PL) and stimulated emission (SE) were measured. The PL intensity of the InGaN epilayers is much higher than that of GaN, even for very small indium concentrations. The PL peaks show the S-shaped temperature dependence, and the stimulated emission threshold is also temperature dependent. The PL and SE also vary greatly with indium concentration. These observations indicate that the way indium incorporates into GaN varies with In concentration. The structural characteristics will be discussed in light of their possible relation to the optical characteristics. This work is supported by ONR, BMDO, and AFOSR.
- Publication:
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APS March Meeting Abstracts
- Pub Date:
- March 2001
- Bibcode:
- 2001APS..MARS29010P