An inductively coupled rf plasma as a medium for carbonitriding aluminum

The exceptional properties of aluminum nitride (AlN) have detained high guarantee of advanced technological applications. An inductively coupled rf plasma has been used to carbonitride aluminum (1050) at different plasma conditions. X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), microhardness indentation and surface microstructure have been employed to investigate properties of the treated surface. The thickness of the carbonitriding layer is very thin in which, the XRD cannot detect it. However, XPS identified, after first run of sputtering the surface, nitrogen-nitrogen and nitrogen-aluminum bonds. The microhardness of the treated sample, at certain plasma conditions, increases 71plasma conditions, we have studied, the temperature was high enough to melt the Al surface and reform large grain structure with wide grain boundaries. This form of structure could admit to the nitrogen and carbon species to react with the bulk material through the wide grain boundaries.