ERRATUM: SiGe CMOS fabrication using SiGe MBE and anodic/LTO gate oxide Sidek, R. M. ; Straube, U. N. ; Waite, A. M. ; Evans, A. G. R. ; Parry, C. ; Phillips, P. ; Whall, T. E. ; Parker, E. H. C. Abstract Publication: Semiconductor Science Technology Pub Date: April 2000 DOI: 10.1088/0268-1242/15/4/501 Bibcode: 2000SeScT..15..423S