Ge deposition on Ag surfaces: Dependence of the adsorption characteristics on the surface orientation
Abstract
Using the ab initio full-potential linear muffin-tin orbital approach we have studied the characteristics of Ge adsorption on three different Ag surfaces. We have analyzed the surface-orientation-dependent characteristics of the Ge adsorption, focusing our attention on comparison between adatom and substitutional adsorption. We find that whereas on the (111) surface substitutional adsorption is preferential, on the (100) and (110) ones the two adsorption modes have similar energetics. Analysis of the adsorption-induced modifications of the electronic structure of both the substrate and the adsorbate supports the thesis that at small coverage, Ge deposition on the Ag surfaces is to a large extent determined by laws characteristic for metal on metal adsorption.
- Publication:
-
Physical Review B
- Pub Date:
- March 2000
- DOI:
- 10.1103/PhysRevB.61.8469
- Bibcode:
- 2000PhRvB..61.8469S
- Keywords:
-
- 68.55.Jk;
- 73.20.At;
- 71.15.Mb;
- Structure and morphology;
- thickness;
- crystalline orientation and texture;
- Surface states band structure electron density of states;
- Density functional theory local density approximation gradient and other corrections