Current, Voltage and Power Measurements in Ar/Cl2 Inductively Coupled Plasmas Using Close-Coupled Probes
Abstract
The use of derivative probes for electrical measurements in rf process plasmas is relatively well established for capacitive systems compared to inductive (ICP) sources where the measurement and analysis is more challenging. Accuracy of the phase measurements is critical requiring robust and calibrated probe transforms. We have used derivative close coupled I-V sensors and subsequent Fourier analysis and probe transforms to measure coil currents and voltages. From this we determined delivered rf source power, less transmission and matching network losses. Our ICP system was excited at 14 MHz from 5W to 80W input powers for both 100 percent Ar and 95 percent Ar / 5 percent Cl2 at a pressure of 2.7 Pa. The measured power delivered to the plasma is different for pure argon and the mixtures indicating process dependence. Our work on further development of probe transforms indicate pure argon plasmas have average transmission and match network losses of 15 percent over the above range.
- Publication:
-
APS Annual Gaseous Electronics Meeting Abstracts
- Pub Date:
- October 2000
- Bibcode:
- 2000APS..GECJWP017O