Implementation of electron emitters for IEC performance enhancement

Previous studies have shown that a critical issue for the performance of IEC devices is the formation of fast ions, condition that can be achieved by increasing the ionization rate of the gas in the region farther from the central cathode, i.e. near the chamber wall. The recent implementation of filament-type electron emitters on those devices is an upgrade aimed to fulfill that near-wall ionization requirement. Pulsed operation of the devices have allowed to operate in the high-current, low-pressure range, improving the machine performance. The combination of both pulsed operation and electron-emitter assisted ionization is expected to give even higher fusion reaction rates , traduced per unit power input than present devices. Details on the design and operation of the electron emitters are presented. Results, both for steady-state and pulsed operation, will be included.