Fabrication and analysis of extreme ultraviolet reflection masks with patterned W/C absorber bilayers
Abstract
- Publication:
-
Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures
- Pub Date:
- March 1997
- DOI:
- 10.1116/1.589309
- Bibcode:
- 1997JVSTB..15..293V