Electron Attachment Studies in Trifluoromethane (CHF_3) using a Pulsed Townsend Technique
Abstract
The electron attachment coefficients and rate constants were determined for CHF3 (fluoroform) by studying electron swarms in a pulsed Townsend electron drift chamber. The technique used involved analyzing the ratio of electron charge to ion charge in the swarm signal for a specific E/N. Data was taken with mixtures ranging between 2.5 and 10 percent CHF3 in Argon gas. Preliminary results indicate that the attachment peaks at sub-thermal energies. Preliminary results also indicate that the attachment coefficients vary from 89.0x10-19 cm^2 at 0.077 eV to 0.59x10-19 cm^2 at 1.53 eV, and the attachment rate constants vary from 33.x10-13cm^3/s at 0.153 eV to 1.5x10-13 cm^3/s at 1.53 eV. A discussion of the technique and the results will be presented.
- Publication:
-
APS Ohio Sections Spring Meeting Abstracts
- Pub Date:
- May 1997
- Bibcode:
- 1997APS..OSS..CD04W