Adsorption of Diblock Copolymers at the Solid/Solution Interface
Abstract
Using a multi-technique approach we have investigated the adsorption of diblock copolymers on both a planar surface of silicon oxide and colloidal silica particles. The adsorbing (A) and non-adsorbing (B) blocks are poly(dimethyl amino ethyl methacrylate) and poly(n-butylmethacrylate), respectively, having an A mole fraction of φ. The solvent, isopropyl alcohol, is a near theta solvent for both A and B blocks. At constant degree of polymerization of 225, the polymer coverage increases rapidly as φ increases, reaches a maximum value of about 4mg/m^2 at φ = 0.05, and decreases monotonically as φ approaches 1. To compliment coverage measurements, neutron reflectivity is used to measure the AB layer thickness and profile. A self-consistent mean field model is used to interpret both the coverage and profile measurements.
- Publication:
-
APS March Meeting Abstracts
- Pub Date:
- March 1997
- Bibcode:
- 1997APS..MAR.I3110C