A Silicon Oxide Antireflective Layer For Optical Lithography Using Electron Cyclotron Resonance Plasma Deposition
Abstract
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- May 1996
- DOI:
- 10.1143/JJAP.35.2863
- Bibcode:
- 1996JaJAP..35.2863M