X-Ray Powder Diffraction Study of Pt(x)Si in a Sputtering= Target and Pt(x)Si/Si(111)
Abstract
X-Ray powder diffraction was used to study films sputtered onto Si(111) from a single-source target composed of Pt and Si. The X-Ray powder pattern of the target was obtained and indicated the existence of all of the known phases of Pt(x)Si. It was found that the compounds that formed within the target were not sputtered onto the substrate, demonstrating that only elemental Pt and Si in their initial volume fractions made up the sputtered Pt(x)Si/Si(111) film. This result was confirmed by analyzing the X-Ray powder pattern of the film before and after annealing. The indexed powder pattern of Pt(x)Si/Si(111) after annealing indicated the existence of PtSi and Si. Our results are vital to applications involving buried Schottky interfaces utilizing the Pt-Si sytem for use as the main component in IR detectors. Supported by DOE Grant No. DE-FG02-94ER45508.
- Publication:
-
APS March Meeting Abstracts
- Pub Date:
- March 1996
- Bibcode:
- 1996APS..MAR.B2006R