Influence of deposition parameters on laser ablation deposited amorphous carbon*1
Abstract
Thin amorphous carbon films were deposited by KrF laser ablation from graphite and glassy carbon targets at different substrate temperatures with beam power density on the target of 3 × 10 8 W cm -2. The films were characterized by electrical resistivity, spectroscopic ellipsometry, ultraviolet transmission, visible and infrared spectra and Raman spectroscopy. The influence on film properties of substrate temperature during deposition varying from room temperature to 425°C was studied. The influence of the temperature and film thickness on the film buckling was also studied. A film resistivity of 10 8 Ω cm and an optical band gap energy of 1.9 eV was achieved. Raman spectra with low D band (I D /I G = 0.46) intensity were obtained.
- Publication:
-
Journal of Non Crystalline Solids
- Pub Date:
- July 1995
- DOI:
- 10.1016/0022-3093(95)00184-0
- Bibcode:
- 1995JNCS..188..118B