EUV metrology of multilayer optics
Abstract
EUV metrology is central to the successful commercialization of EUV projection lithography. Metrology carried out at the EUV wavelength of 13 nm enables a gain of approximately 50 in precision when translated from visible light wavelengths. It also uniquely measures wavefront errors due to lateral variations in the inherent phase shift upon reflection from the multilayer coating. The authors present the development of two metrology techniques: EUV Foucault and Ronchi tests.
- Publication:
-
Presented at the Optical Society of America Conference on Extreme Ultraviolet Lithography
- Pub Date:
- November 1994
- Bibcode:
- 1994osa..conf...19R
- Keywords:
-
- Coatings;
- Extreme Ultraviolet Radiation;
- Metrology;
- Optical Measurement;
- Ronchi Test;
- Aberration;
- Lenses;
- Optical Equipment;
- Phase Shift;
- Wave Fronts;
- Optics