SF6 sensitized CO2-laser chemical vapor deposition of a-Ge:H Barth, M. ; Hess, P. ; Mollekopf, G. ; Stafast, H. Abstract Publication: Thin Solid Films Pub Date: April 1994 DOI: 10.1016/0040-6090(94)90397-2 Bibcode: 1994TSF...241...61B