Low-energy Ion-Beam Deposition apparatus equipped with surface analysis system
Abstract
A sophisticated apparatus for low energy ion beam deposition (IBD) was installed at Takasaki Radiation Chemistry Research Establishment of JAERI in March 1991. The apparatus is composed of an IBD system and a real time/in-situ surface analysis system for diagnosing deposited thin films. The IBD system provides various kinds of low energy ion down to 10 eV with current density of 10 micro A/sq cm and irradiation area of 15 x 15 sq mm. The surface analysis system consists of RHEED, AES, ISS and SIMS. This report describes the characteristics and the operation procedure of the apparatus together with some experimental results on depositing thin carbon films.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- October 1994
- Bibcode:
- 1994STIN...9532712O
- Keywords:
-
- Carbon;
- Ion Beams;
- Irradiation;
- Radiation Chemistry;
- Surface Properties;
- Thin Films;
- Vapor Deposition;
- Beam Currents;
- Current Density;
- Electron Spectroscopy;
- Energy Transfer;
- Mass Spectrometers;
- Real Time Operation;
- Nuclear and High-Energy Physics